The Model 300
Family of Chemical
Dispensing Systems
Field Proven Technology
The Model 300 Family of Integrated Dispense Systems provides
automated control and monitoring of all critical process parameters. The un=
its
have no mechanical displacement and are designed to monitor and dispense all
photolithography chemistries.
Photoresist is dispensed at=
a
precise rate and can be delivered with swing-arm synchronization. Edge-bead
remover (EBR) and developer are bubble-free and dispensed at a uniform
flow-rate.
The dispense units integrate chemical source switching, liqu=
id
level detection and chemical dispensing into one unit. Flexibility in reser=
voir
sizes allows the system to be adapted to a wide range of chemical dispensing
applications.
The system uses digitally controlled Pulse Width Modulation =
to
control process gas, and chemistry is displaced through a completely integr=
ated
filter. Because there is only one moving part in the flow path, the systems=
are
incredibly reliable and maintenance-free.